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ITO Target Sintering Furnace | High Temperature Sintering Equipment

PRODUCT PARAMETERS

Description
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Description

High-aluminum setter (HR88) is a high-performance setter product made of high-purity alumina as the main raw material and processed by high-temperature sintering and double-sided precision grinding. It is specially used for the high-temperature sintering process of ITO targets (indium tin oxide targets) to ensure the flatness and quality of the targets during the firing process.

ITO target material is the core material covered with indium tin oxide film on displays such as PDP, LCD, Organic LED (OLED), and is an important factor in ensuring conductivity and transparency. During the ITO target firing process, if the flatness of the burner plate is insufficient, the target is prone to bending and deformation, requiring multiple grinding and repairs, which significantly increases production costs. Our company’s high-aluminum set-up plate ensures high flatness (flatness tolerance ±0.05mm) through a double-sided grinding process, which effectively prevents deformation and bending during target firing and achieves high-quality firing of ITO targets.

Product Features

  1. High Purity, No Target Contamination

Al₂O₃ content reaches 88.16%, Fe₂O₃ content is only 0.08%, with extremely low impurity content. No volatiles are emitted at high temperatures, ensuring the purity and transparency of the ITO target material.

  1. Double-Sided Grinding, High Flatness

The product undergoes double-sided precision grinding, with flatness tolerance controlled within ±0.05mm, effectively preventing bending and deformation of the ITO target material during firing due to unevenness of the firing plate.

  1. Operating Temperature Up to 1650℃

Fully meets the temperature requirements of the high-temperature sintering process of ITO targets, ensuring target densification and performance optimization.

  1. Excellent High-Temperature Bending Strength

Maintains good bending strength and dimensional stability at 1650℃, without deformation during long-term use, ensuring batch consistency of the target material.

  1. Excellent thermal shock resistance

It can withstand frequent temperature cycles without cracking, resulting in a long service life and reduced replacement frequency.

  1. Significantly reduced production costs

The application of a highly flat firing plate avoids the need for multiple grinding and repairs after the target material is fired, significantly saving production costs and improving production efficiency.

Product Technical Specifications (English)
ProjectHR88
Al₂O₃(%)88.16
SiO₂(%)11.5
Fe₂O₃(%)0.08
Use temperature(℃)1650
Flatness tolerance(mm)± 0.05
Standard Sizes (English)
Standard Size(mm)
1000 × 500 × 35 ~ 40T
800 × 425 × 35T
600 × 400 × 30 ~ 35T
900 × 450 × 35T
700 × 400 × 35T
500 × 500 × 30T

Application Areas

  • ITO Target Sintering: Used for high-temperature sintering of indium tin oxide (ITO) targets for PDP, LCD, OLED, and other displays.
  • High-Precision Electronic Ceramic Sintering: Suitable for sintering electronic ceramic products with extremely high flatness requirements.
  • Optical Material Sintering: Used for high-temperature sintering of various optical glass and optical ceramic materials.
  • Other High-Purity Material Sintering: Suitable for high-tech material sintering processes with strict requirements for purity and flatness.

Frequently Asked Questions (FAQ)

  1. Why is a double-sided ground sintering plate used during ITO sputtering?

If the sintered plate is not flat enough during ITO sputtering, the sputtered material is prone to bending and deformation, requiring multiple grinding and repairs, which increases costs.

  1. What is the maximum operating temperature of the product?

The maximum operating temperature is 1650℃, fully meeting the sintering temperature requirements of ITO sputtering materials.

  1. Will the product contaminate the ITO sputtering material?

No. The product has an Al₂O₃ content as high as 88.16% and Fe₂O₃ as low as 0.08%, with no volatiles at high temperatures, ensuring the purity and transparency of the ITO sputtering material.

  1. What is the flatness tolerance of the product?

The flatness tolerance is ±0.05mm, providing a highly flat bearing surface for ITO target sintering.

  1. Is this product suitable for sintering other electronic ceramics?

Yes. The product’s high purity and high flatness characteristics are also suitable for the sintering processes of various electronic ceramics and optical materials with strict requirements for flatness and purity.

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