Luoyang Anjing Intelligence Equipment are a global leader in high-temperature electric furnaces
Dual-Tube Diffusion Furnace for Semiconductor and Material Research
PRODUCT PARAMETERS
Description
Dual-tube Diffusion Furnace (Dual-Atmosphere Dual-Tube-Tube Furnace)
The dual-tube diffusion furnace (dual-atmosphere dual-tube-tube furnace) features an independent dual-tube design, enabling two independent heating systems and dual-atmosphere control. This meets the needs of simultaneous operation of different processes or comparative experiments of different parameters within the same process. The equipment supports independent temperature control, independent gas supply, and independent program control, allowing for simultaneous diffusion, annealing, sintering, oxidation, reduction, and atmosphere heat treatment, significantly improving experimental efficiency and equipment utilization.
The entire unit utilizes a high-purity alumina fiber furnace lining, a high-efficiency insulation structure, and an intelligent PLC control system, featuring rapid heating, uniform temperature, high temperature control accuracy, and a high degree of automation.
Product Features
- Dual-Tube Furnace Structure, Dual Use in One Furnace
This equipment adopts a dual-tube parallel design, equipped with two independent furnace tubes, which can simultaneously run the same process or execute different processes. Compared with a single-tube furnace, the capacity is doubled, and the equipment utilization rate is higher, making it particularly suitable for scenarios requiring batch control experiments or processing different samples simultaneously.
- Dual Gas Path Independent Control, Flexible Process Switching
Each furnace tube is equipped with an independent gas path system, which can be used to introduce various gases such as nitrogen, argon, oxygen, and hydrogen. The two furnace tubes can run different atmosphere processes without interference. The gas flow rate is adjustable from 0-20L/min, meeting diverse needs from protective atmospheres to reactive atmospheres.
- Multiple Temperature Levels Available, Covering 1200-1800℃
Five temperature levels are available: 1200℃, 1400℃, 1600℃, 1700℃, and 1800℃. The 1200℃ level is equipped with silicon carbide rod heating, and 1600℃ and above are equipped with silicon molybdenum rod heating. Temperature control accuracy is ±1℃, and the temperature field uniformity inside the furnace is ±1℃, meeting the process temperature requirements of different materials.
| Category | 1200℃ | 1400℃ | 1600℃ | 1700℃ | 1800℃ |
|---|---|---|---|---|---|
| Power Supply | 220V / 380V | 220V / 380V | 220V / 380V | 220V / 380V | 220V / 380V |
| Continuous Operating Temperature | 1150℃ | 1350℃ | 1550℃ | 1650℃ | 1750℃ |
| Temperature Control Accuracy | ±1℃ | ±1℃ | ±1℃ | ±1℃ | ±1℃ |
| Furnace Tube Material | Stainless steel / Quartz glass / Alumina tube | Alumina tube | Alumina tube | Alumina tube | Alumina tube |
| Temperature Uniformity | ±1℃ (multi-zone control available) | ±1℃ (multi-zone control available) | ±1℃ (multi-zone control available) | ±1℃ (multi-zone control available) | ±1℃ (multi-zone control available) |
| Temperature Sensor & Range | Type K, 0~1350℃ | Type S | Type B | Type B | Type B |
| Programmable Segments | 50 / 22 / 8 segments | 50 / 22 / 8 segments | 50 / 22 / 8 segments | 50 / 22 / 8 segments | 50 / 22 / 8 segments |
| Heating Rate | 1℃/h ~ 40℃/min | 1℃/h ~ 40℃/min | 1℃/h ~ 40℃/min | 1℃/h ~ 40℃/min | 1℃/h ~ 40℃/min |
| Heating Elements | SiC rods | SiC rods | MoSi₂ rods | MoSi₂ rods | MoSi₂ rods |
| Heating Element Position | Surrounding the tube, horizontally aligned | Surrounding the tube, horizontally aligned | Surrounding the tube, horizontally aligned | Surrounding the tube, horizontally aligned | Surrounding the tube, horizontally aligned |
| Refractory Material | High-purity alumina fiber board | High-purity alumina fiber board | High-purity alumina fiber board | High-purity alumina fiber board | High-purity alumina fiber board |
Application Areas
- Semiconductor and Photovoltaic Diffusion Processes: Suitable for diffusion, oxidation, and annealing processes of semiconductor silicon wafers and photovoltaic cells. The dual-tube structure allows for simultaneous processing of samples from different batches or under different conditions, improving process development efficiency.
- Electronic Ceramic Sintering: Suitable for pre-sintering, sintering, and heat treatment of materials such as electronic ceramics, MLCCs, and piezoelectric ceramics. Independent temperature control in both tubes allows for simultaneous comparative experiments with different temperature profiles.
- Nanomaterial Preparation: Suitable for vacuum or atmospheric heat treatment of novel materials such as carbon nanotubes and nanopowders. The dual-furnace tube structure allows for simultaneous comparative experiments under different atmospheric conditions, accelerating the development of new materials.
- CVD Processes: Suitable for chemical vapor deposition (CVD) processes, such as the deposition of graphene and silicon carbide thin films. The dual tubes operate with different precursors or at different temperature conditions, improving process development efficiency.
- Universities and Research Institutes: Suitable for experimental teaching and research projects in materials science and engineering, physics, chemistry, and related fields.
- Industrial and Mining Enterprises: Suitable for large-scale production of small-batch products or process verification. Simultaneous operation of both pipes can increase the production capacity of a single batch and meet the needs of pilot-scale production.
Company Profile
A professional enterprise specializing in heat treatment technology services and the R&D, manufacturing, and sales of high-temperature electric furnaces.
The company focuses on developing high-temperature electric furnaces covering a full temperature range of -100℃ to 2600℃. Its products include experimental electric furnaces, vacuum atmosphere furnaces, industrial kilns, and medium-frequency induction heating equipment. Main products include box furnaces, tube furnaces, lifting furnaces, pusher kilns, bogie furnaces, rotary kilns, tunnel kilns, and various specialized medium-frequency furnaces.
The company adheres to technological innovation and has passed ISO9001 and EU CE certifications. It owns 21 registered trademarks, 29 patents, and 27 software copyrights.
Payment Methods
TT
Shipment Methods
The electric furnace is packaged in three layers: first wrapped in foam paper, then wrapped in plastic film, and finally packed in a wooden crate.
Frequently Asked Questions (FAQ)
- Can the two furnace tubes be controlled independently?
Yes. Each furnace tube is equipped with an independent temperature control system, gas supply system, and program control, allowing for the setting of different temperatures, times, and process parameters.
- Can the two furnace tubes use different atmospheres?
Yes. The dual furnace tubes support independent control of two atmospheres. Each furnace tube can be individually supplied with different gases such as nitrogen, argon, oxygen, and hydrogen without interference.
- What processes is the dual-tube diffusion furnace suitable for?
Suitable for various high-temperature processes such as semiconductor diffusion, oxidation, annealing, sintering, reduction, atmosphere heat treatment, material synthesis, and scientific research experiments.
- Does it support automated control and data communication?
Yes. The equipment can be configured with a PLC, touch screen, RS485, or Ethernet communication interface to achieve program control, remote monitoring, data storage, and historical curve export.
- Can it be customized according to process requirements?
Yes. Furnace tube size, maximum temperature, number of temperature zones, gas path configuration, vacuum system, automatic feeding and discharging system, and control method can all be customized according to customer process requirements.
